NIL专利产品

小型纳米压印机

产品简介:

Process is controlled by a programmable PLC with touch screen user interface.

User can customize process parameters.

Wafer and Mold are held by vacuum chuck

UV curable imprint polymer compatible with traditional photolithography process

工艺参数

Wafer size 4 in

Imprintable wafer area 2 in

Imprint pressure 0 - 25 PSI (upgradable to 100 PSI imprint pressure)

Mold substrate size 5 x 0.090 in

Typical imprint throughput < 5 minutes/wafer

设备尺寸及环境要求

Controller Platform

Dimension 5.8 x 16.5 x 12 in 17 x 16 x 15 in

Weight 18.5 LB 45 LB

Environment 10 - 35 C， 65% 10 - 35 C， 65%

Facility requirements

Filtered Pressure source 70 - 100 PSI

Vacuum source <-14 PSI

Power 110-220V， 2A， 50/60 Hz

Clean-room class 1000 or better